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PRODUCTS
SP - Sulfonic Acid Resin, MP
SP - Triethylamine Resin, MP
SP - Carbonate Resin, MP
SP - Borohydride Resin, MP
SP - Cyanoborohydride Resin, MP
SP - Thiophenol Resin, MP
SP - Thiourea Resin, MP
SP - Sulfonyl Chloride Resin, MP
SP - Aminopolyhydroxy Resin, MP
SP - Diisopropylethylamine Resin, MP
SP - Trisamine Resin, MP
SP - Hydrazide Resin, MP
SP - Tribromide Resin, MP
SP - Merrifield High Loaded Resin, MP
SP - Thiophenol Resin, MP Fine
SP - Thiourea Resin, MP - Fine
SP - Trisamine Resin, MP - Fine
SP - Thio - Silica
SP - Trisamine - Silica
SP - Thiourea - Silica
SP - TMT - Silica
SP - Aminopolyhydroxy Resin, MP - Fine
SP - Piperazine - Silica
SP - Piperazine Resin, MP
SP - TMT Resin, MP
SP-DIISOPROPYLETHYLAMINE RESIN (DIEA), MP
PRODUCT:
SP -Diisopropylethylamine Resin, MP, a highly cross-linked polystyrene resin functionalized  with a  non-nucleophilic base, diisopropylethylamine, also called Huenig’s base end group.
 
APPLICATIONS:
  • SP-DIEA can be used in applications requiring a tertiary amine base and where the resin-bound ammonium salt byproducts are readily separated by filtration.
  • One pot synthesis of amides, sulfonamides and carbamates can be effected using filtration as the only purification step when SP-DIEA is used in conjunction with SP-Trisamine as a scavenger resin.
  • SP-DIEA is linked to the polystyrene backbone through the benzylic position by analogy to other resin-bound amine bases, e.g. morpholinomethyl polystyrene.
  • The increased steric hindrance associated with the diisopropyl substitution affords a significantly more stable benzylic tertiary amine base, even in the presence of reactive electrophiles like chloroformates.
  • SP-DIEA has a highly cross-linked macroporous resin backbone, hence SP-DIEA is not dependent on swelling to be effective, making it compatible with a broad range of solvents including highly polar solvents.
PROPERTIES:
Resin Type:
  Macroporous Poly(styrene-co-divinylbenzene)
Loading:        2.8 - 2.4 mmol/g (based on nitrogen analysis)
Bead Size:     330-1225 microns, 15-50 mesh (>90% within)
Conditions: 2-3 equiv relative to limiting reagent
Compatible Solvents: DCM, THF, DMF, acetonitrile
   
REFERENCES:
  1. Bhattacharyya, S.; Fan, L.; Vo, L.; Labadie, J. Combi Chem & High Throughput Screen, 2000, 3, 117.
  2. Conti, P.; Demont, D.; Cals, J.; Ottenheijm, H. C. J.; Leysen, D. Tetrahedron Lett 1997, 38, 2915.
  3. Booth, R. J.; Hodges, J.C. J. Am. Chem. Soc 1997, 119, 4882.
  4. Yang, B. V.; O' Roarke, D.; Li J. Synlett 1993, 195.
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