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PRODUCTS
SP - Sulfonic Acid Resin, MP
SP - Triethylamine Resin, MP
SP - Carbonate Resin, MP
SP - Borohydride Resin, MP
SP - Cyanoborohydride Resin, MP
SP - Thiophenol Resin, MP
SP - Thiourea Resin, MP
SP - Sulfonyl Chloride Resin, MP
SP - Aminopolyhydroxy Resin, MP
SP - Diisopropylethylamine Resin, MP
SP - Trisamine Resin, MP
SP - Hydrazide Resin, MP
SP - Tribromide Resin, MP
SP - Merrifield High Loaded Resin, MP
SP - Thiophenol Resin, MP Fine
SP - Thiourea Resin, MP - Fine
SP - Trisamine Resin, MP - Fine
SP - Thio - Silica
SP - Trisamine - Silica
SP - Thiourea - Silica
SP - TMT - Silica
SP - Aminopolyhydroxy Resin, MP - Fine
SP - Piperazine - Silica
SP - Piperazine Resin, MP
SP - TMT Resin, MP
SP -SULFONIC ACID RESIN, MP
PRODUCT:
SP - Sulfonic Acid Resin, MP, a highly cross-linked polystyrene resin functionalized with a  
p-toluenesulfonic acid (TsOH) end group
 
APPLICATIONS:
  • SP-Sulfonic Acid is a strong cation-exchange resin and a versatile base scavenger.
  • SP-Sulfonic Acid can be used to scavenge primary, secondary, and tertiary amines, including heterocyclic bases, by quaternary salt formation.
  • SP-Sulfonic Acid is a useful alternative to quenching reactions with aqueous acids.
  • It can also be applied in a range of acid-mediated quenching and catalytic reactions.
  • SP-Sulfonic Acid can be used in solid-phase extraction (SPE) of amine bases in sample preparation of bio-analytes such as blood, urine etc.
  • The resin may also be used to perform “Catch and Release” purification of amine derivatives from an organic reaction mixture such as reductive amination reactions, and fermentation broth.
  • SP-Sulfonic Acid is clean and does not contain any leachable impurities.
PROPERTIES:
Resin Type:
 Macroporous poly(styrene-co-divinylbenzene)
Loading:       5.2 - 4.8 mmol/g (based on titration and amine uptake)
Bead Size:    400-1100 microns, 20-40 mesh (>90% within)
Typical Scavenging: Approx. 2.5 equiv of resin relative to amine, 0.5-1 h at ambient temperature
Compatible Solvents: DCM, THF, DMF, MeOH, EtOH
   
REFERENCES:
  1. Suto, M. J.; Gayo-Fung, L. M.; Palanki, M. S. S.; Sullivan, R. Tetrahedron 1998, 54, 4141.
  2. Parlow, J. J.; Flynn, D.L. Tetrahedron 1998, 54, 4013
  3. Lawrence, M, R.; Biller, S. A.; Fryszman, O. M.; Poss, M, A. Synthesis 1997, 553.
  4. Shuker, A. J.; Siegel, M. G.; Matthews, D. P.; Weigel, L. O. Tetrahedron Lett. 1997, 38, 6149.
  5. Siegel, M.G.; Hahn, P. J.; Dressman, B. A.; Fritz, J. E.; Grunwell, J. R.; Kaldor, S. W. Tetrahedron Lett, 1997, 38, 3357.
  6. Gayo, L. M.; Suto, M. J. Tetrahedron Lett. 1997, 38, 513.
  7. Flynn, D, L.; Crich, J. Z.; Devraj, R. v.; Hockerman, S. L.; Parlow, J ,J.; South, M. S.; Woodard, S. S. J. Am. Chem. Soc. 1997, 119, 4874.
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